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Lithographie de nouvelle génération par nanoimpression ...

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UV-NIL UV curing NanoImprint Lithography page 26 XPS X-ray Photoelectron Spectroscopy page 113 8. Index des symboles utilis´es Symbole D´efinition Unit´e Page c Cot´e de la puce imprim´ee mm, µm page 88 δ Taux de remplissage de motifs (δ = L/(L+S)) - page 88 ∆ hr Variation de hr nm page 92 η Viscosit´e de la r´esine mPa.s page 88 F Force appliqu´ee en face arri`ere du moule N ...

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Lithographies nonNanoimpression, Nanocompression ...

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Nanoimpression (nanoimprint) 3. Gravure ionique réactive 4. Métallisation et Lift-Off Impression Transfert 1. Impression à T>Tg Polymère Substrat Moule 2. Séparation à T<Tg Montage (LPN) - Presse hydraulique commerciale équipée de plaques chauffantes 4’-To régulée (<300oC) - large gamme de pression (<15 tonnes) - bas coût (S. Chou- Princeton- 1995) Réunion Techno GDR Physique ...

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The invention of nanoimprint lithography, a high-throughput and low-cost manufacturing technology, makes the fabrica- tion of QMD economically viable.4) Previously, nanodot ar- ray with 400 Gdots/in2 density was fabricated using nanoim- and the magnetic force microscope's print lithography, (MFM) writing and reading of Ni based QMD with a stor- age density up to 7.5 Gbits/in2 and a switching ...

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10 emerging technologies that will change the world 2003

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Nanoimprint Lithography A world of Lilliputian sensors, transistors, and lasers is in development at nano-technology labs worldwide.These devices point to a future of ultrafast and cheap electronics and communications. But making nanotechnology relevant beyond the lab is difficult because of the lack of suitable manufacturing techniques. The tools used to mass-produce silicon microchips are ...

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AUTHOR QUERY FORM Chapter: CH005

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e-beam lithography [35], dip-pen lithography [36], nanoimprint lithography [37], microcontact printing [38,39], elastomeric stencil [40], ink-jet printing [41], and optical tweezer [42]. Although these techniques successfully manipulated cell detachment (or cell adhesion), they failed to show a concrete evidence of con- trolled cell movement. Furthermore, these techniques applied unintended ...

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3.1.3 Monodomain porous alumina obtained by nanoimprint lithography (NIL) ... In princi-ple, monodomain porous alumina on a cm2 scale can be fabricated by this imprint method. 32. Figure 3.4: SEM image of the imprint master stamp consisting of Si 3N 4 pyramids with a 500nm lattice constant and a 260nm height: (a) top and (b) cross-section views of the imprint master stamp[97]. The details of ...

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lithography and dry etch processes followed by CMP. Characterisation was carried with SEM and AFM. The first devices we built were configured as linear encoders of position and motion. The devices performance was demonstrated with electrical testing using an independent nanopositioner. Strong signals in μA range were obtained on scans from several hundred nm to several mm range. The principle ...

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interest.32,33 Interferometric lithography (IL)34,35 is an attractive approach because it offers the possibility of carrying out lithographic modification rapidly over macroscopicareas.Moreover,becauseoftheeasewith which the exposure parameters may be controlled, it offers a great deal of flexibility and provides, in princi-

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